| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which modulates laser beam for exposure at high speed and can deflect it with sufficient amplitude. SOLUTION: The light beam form a laser 172 for exposure is reflected on a beam splitter 173, collected by a lens 174, and modulated and deflected by an AOM 175 arranged so as to be deviated from a focus plane. Diffused light modulated by the AOM 175 is collimated by a lens 176, collected by an object lens 190 through reflection mirrors 177, 179, a polarization beam splitter 186, a 1/4 wavelength plate 187, and a lens 188, and exposes a glass original disk 191. When a light beam is not deflected, it is reflected by a reflection mirror 180, collected by a lens 181, modulated by an AOM 182, and exposes the glass original disk 191 in the same way using a light path reaching a polarization beam splitter 186 through a lens 183, a beam splitter 184, and a 1/4 wavelength plate 185. |
