发明名称 PHOTOSENSITIVE MATERIAL PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress the increase of a production cost which may arise from the execution of an antimicrobial treatment. SOLUTION: The machine frame 14 of a PS plate (photosensitive planographic printing plate) processor 10 is circumferentially enclosed by outside plate panels 76a to 76G. The processing liquid processing section of the PS plate processor is disposed in a frame 20 of a box body shape of which the upper opening is closed, with a top cap 70 and which is enclosed by an insertion table 16, side covers 72, 74 and the outside plat cover 76G provided with a discharge port 104. This frame is subjected to an antimicrobial treatment by pressing of antimicrobial stainless steels uniformly distributed with copper as a simple substance. As a result, the sure antimicrobial treatment may be executed at the cost lower than the cost of molding by antimicrobial resins or applying of an antimicrobial coating material.
申请公布号 JPH10288843(A) 申请公布日期 1998.10.27
申请号 JP19970099097 申请日期 1997.04.16
申请人 FUJI PHOTO FILM CO LTD 发明人 ICHIKAWA KAZUO;YOSHIDA SUSUMU
分类号 G03F7/30;A61L2/16;(IPC1-7):G03F7/30 主分类号 G03F7/30
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