发明名称 ETCHING SOLUTION FOR POLYAMIDE RESIN
摘要 PROBLEM TO BE SOLVED: To obtain an etching soln. with which the surface of a polyamide resin can be etched so that a metal film can be formed thereon by electroless plating with a high adhesiveness by specifying the compounding ratio of an inorg. acid to formic acid in the soln. SOLUTION: At least one acid selected from among hydrochloric, sulfuric, nitric, and phosphoric acids is used as the inorg. acid, and the amt. of it incorporated is 1.5-6.0 mol/l. The amt. of formic acid incorporated is 1.0-10 mol/l. The etching temp. of a polyamide resin with the soln. can be suitably set depending on the type of a polyamide resin being etched, the compsn. of an electroless plating bath used, etc., for instance, in the range of 20-50 deg.C. When an immersion process is adopted, the immersion time can be in the range of 1-30 min. A polyamide resin suitable to be etched with the soln. is a ring-opening polymer made fromε-caprolactam, etc., such as nylon 6 or nylon 11.
申请公布号 JPH10287756(A) 申请公布日期 1998.10.27
申请号 JP19970108237 申请日期 1997.04.10
申请人 MERUTETSUKUSU KK 发明人 KUROKAWA YUTAKA;SASAOKA MASANOBU;YAMAMOTO SEIICHI;NAGAKURA MASAYUKI
分类号 C08J7/00;C08J7/02;C23C18/22;(IPC1-7):C08J7/00 主分类号 C08J7/00
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