| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to produce a liquid crystal display element having light shielding films having high light absorptivity and insulating characteristic in combination with good reproducibility and simple stages by etching away the films corresponding to pixel electrodes among the formed films. SOLUTION: The surface of a glass substrate 1 is spin coated with a raw liquid 11 for the light shielding film formed by mixing a semiconductor material having the light absorptivity with powder of boron, etc., over the entire surface. The coating is thereafter subjected to a heat treatment in the atm. to evaporate the raw liquid 11 for the light shielding film, by which the semiconductor material having the insulating characteristic and the light absorptivity is made to remain on the glass substrate 1 and the insulative light shielding film 12 is formed. Further, the film is cured by subjecting the film to the heat treatment. The photoresist pattern is next formed by a resist 13. The insulative light shielding film 12 and surface protective film 10 formed on the transparent electrode 9 are simultaneously patterned by a dry etching method or medicinal liquid etching method. The insulative light shielding film 12 and the resist 13 are removed by the dry etching method or medicinal liquid etching method, by which the insulative light shielding patterns are formed. |
