| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray exposure device in which the compressive strength and area of an X-ray take-out window can be increased, and the exposure of a wide exposure area can be attained without generating the problem of a divergent angle or generating oscillation. SOLUTION: In this device, an X-ray take-out window 15 used also as a vacuum barrier plate separating a beam line from an X-ray exposure device is constituted so as to be shaped like a cylindrical face curved like a circular- arc, and disposed so that a beam line side can be a projecting part and an X-ray exposure device side can be a recessed part for plotting an arc on a synchrotron track face. A synchrotron radiation beam 12 emitted from a photoelectric storage ring 11 and condensed by a condenser mirror 13 is largely scanned to a vertical direction to the track face by a scanning mirror 14, and an X-ray mask 16 of the exposure device is irradiated through the cylindrical face-shaped X-ray fetching window 15, and the mask pattern is transferred to a wafer 17. |
