| 摘要 |
PROBLEM TO BE SOLVED: To realize uniformity of resin pattern dimension, by setting a plurality of regions on the surface of a member having area equivalent to a substrate and coming in contact with developer, and controlling each of the regions at a temperature suitable for development. SOLUTION: A substrate 1 is mounted on a substrate holder 2, and developer 5 is heaped on the substrate 1. A soaking plate is arranged to come into contact with the developer 5. Electronic temperature control elements 7, 8 control the temperature of a soaking plate 6 to optimize development characteristics. A circulating radiation water inlet 10 and a circulating radiation water outlet 11 are fixed to a circulating radiation part 9 positioned above the control elements 7, 8, and take out the discharged heat of the elements 7, 8 to the outside. After a specified time, the soaking plate is separated from the developer 5, and the treatment is finished by washing the developer 5 on the substrate 1 with pure water. As a result, difference of developing characteristics in each region is excluded, and developing characteristics or pattern width are made uniform. |
