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发明名称
SEMICONDUCTOR SUBSTRATE CLEANING LIQUID AND CLEANING METHOD
摘要
申请公布号
JPH10284464(A)
申请公布日期
1998.10.23
申请号
JP19970105326
申请日期
1997.04.08
申请人
SONY CORP
发明人
KUBOTA MICHITAKA
分类号
H01L21/306;H01L21/304;H01L21/308;(IPC1-7):H01L21/306
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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