首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
EXPOSURE METHOD
摘要
申请公布号
JPH10284408(A)
申请公布日期
1998.10.23
申请号
JP19970105240
申请日期
1997.04.08
申请人
NIKON CORP
发明人
KAWAI HIDEMI
分类号
G03F7/20;H01L21/027;(IPC1-7):H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
您可能感兴趣的专利
PILE AND PILES INSTALLATION METHOD
DEVICE FOR MEASURING LENGTH OF COILED MATERIALS
FEEDING AND TENSIONING OF THE WARP ON THE WEAVING LOOM
METHOD OF OBTAINING MAGNETOOPTIC STRUCTURE
ELECTROLYTE FOR BRIGHT ZINC PLATING
STEEL
METHOD OF MANUFACTURING BLADES FOR EARTH-MOVING MACHINES
APPARATUS FOR DRYING LEATHER SEMIPRODUCTS
METHOD OF BLOWING-OUT A BLAST FURNACE
ANTICORROSION COATING COMPOUND
METHOD OF PRODUCING CONCENTRATED LIPOTON
POLYMER COMPOUND
METHYL-5-0-BENZYL-3-DEOXY-3-FLUORO- -D-RIBOPENTAFURANOSIDE- 2-ULOSE HYDRATE AS A INTERMEDIATE PRODUCT IN SYNTHESIS OF METHYL-5-0-BENZYL-2-0-BENZOYL-3-DEOXY-3-FLUORO- -D-RIBOPENTAFURANOSIDE
ANALOG MAGNETIC RECORDER
RODS FLEXURE VIBRATIONS SIMULATOR
ADDRESSING UNIT
LOGIC MODULE
THERMAL CHAMBER
PRESSURE REGULATOR
DEVICE FOR MEASURING RESISTANCE INCREMENT
