发明名称 PHOTOSENSITIVE RESIN DEVELOPER, DEVELOPING METHOD AND PRODUCTION OF COLOR FILTER
摘要 <p>PROBLEM TO BE SOLVED: To eliminate film peeling and film residues, to enhance resolution, to widen the permissible time of development to enhance the uniformity of development and to prevent the occurrence of broad unevenness by specifying the contact angle with a photosensitive resin surface. SOLUTION: The photosensitive resin developer of >=25 to <=40 deg. in the contact angle with the photosensitive resin surface is used. More preferably, the contact angle with the photosensitive resin is >=28 to <=37 deg.. If this contact angle is too high, wettability is insufficient. If the contact angle is too low, the wettability increases so high that pattern peeling occurs. In both cases, the permissible time width for development is not sufficiently improved and the broad unevenness is not eliminated. The definition of the contact angle refers to the static contact angle of the photosensitive resin to be developed with its non-exposed surface. The measurement is executed by a method for using a commercially marketed contact angle meter, adhering a water drop of 2 mm in diameter to the non-exposed surface of the photosensitive resin, measuring the angle formed by the line connecting the end and apex of the water drop and a horizontal plane and calculating the angle by doubling the value.</p>
申请公布号 JPH10282687(A) 申请公布日期 1998.10.23
申请号 JP19970086661 申请日期 1997.04.04
申请人 MITSUBISHI CHEM CORP 发明人 SAKO NAOKI
分类号 G02B5/20;G03F7/32;(IPC1-7):G03F7/32 主分类号 G02B5/20
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