ELECTROPHOTOGRAPHIC PHOTORECEPTOR FOR REVERSING DEVELOPMENT

摘要

PROBLEM TO BE SOLVED: To prevent the occurrence of image defects despite of high sensitivity by anodically oxidizing a substrate made of Al having a specified Mg, Fe and Si contents and subjecting the oxidized substrate to pore sealing treatment in a soln. contg. Ni ions. SOLUTION: A substrate made of Al consisting of <=3.0 wt.% Mg, <=0.2 wt.% Fe, <=0.1 wt.% Si and the balance Al with inevitable impurities is anodically oxidized to form an anodic oxide film of 2-15μm thickness on the surface. The oxidized substrate is subjected to pore sealing treatment by immersion in a soln. contg. Ni ions. Nickel acetate or nickel fluoride is preferably used as the Ni ion source. The pore sealing treatment is preferably carried out so that the concn. of Ni in the anodic oxide film is regulated to 0.05-2.0 wt.%. An org. photoconductive layer is then formed on the substrate.