发明名称 METHOD OF DEPOSITION OF A METAL ON A METAL SURFACE AND THE PRODUCT THEREOF
摘要 <p>The present invention relates to a method, and the product thereof, of reducing one or more metal centres of one or more organometallic precursors in the presence of a metal surface to deposit sub-monolayer, monolayer or multilayer quantities of the metal centres thereon. Further, the invention relates to a method, and the product thereof, of hydrogenating an organometallic precursor over a metal surface to deposit sub-monolayer, monolayer or multilayer quantities of the metal centre of the precursor thereon. Preferably, the method permits real time control over surface stoichiometry of the evolving surface resulting from the reaction. Finally, the present invention relates to a method of manufacturing electrodes having bimetallic or polymetallic clusters or surfaces for use in fuel cells.</p>
申请公布号 WO1998046805(A2) 申请公布日期 1998.10.22
申请号 CA1998000321 申请日期 1998.04.09
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