| 摘要 |
PURPOSE:To obtain a positive type photoresist composition excellent in the image contrast, and excellent in a sectional shape and having the improved heat resistance by compounding at least one kind selected from the specific compounds as a photosensitive component in an alkali soluble novolak type resin. CONSTITUTION:This composition is compounded at least one knid among the compounds expressed by formula I or formula II as the photosensitive compo nent to the alkali soluble novolak resin. In formulae I and II, at least one of D<1>-D<3> is a naphthoquinone -1, 2-diazide sulfonyl group and the balance is hydro gen atom, and l-n is 0 or an integer among 1-3. Thus the image contrast and the sectional shape of the pattern are excellent and the resist pattern of excel lent heat stability is formed. |
