发明名称 Protecting semiconductor material against contamination
摘要 In a semiconductor material protection system and method, the semiconductor material (preferably silicon) is located on the surface of ultra-pure water ice. Preferably, the ice is formed from ultra-pure water of conductivity greater than 0.07 mu S and is present on the surface of a support.
申请公布号 DE19716374(A1) 申请公布日期 1998.10.22
申请号 DE19971016374 申请日期 1997.04.18
申请人 WACKER-CHEMIE GMBH, 81737 MUENCHEN, DE 发明人 WOLF, REINHARD, DIPL.-ING., 84547 EMMERTING, DE;FLOTTMANN, DIRK, DIPL.-CHEM. DR., 84503 ALTOETTING, DE;SCHANTZ, MATTHAEUS, 84367 REUT, DE
分类号 F25C1/12;B07B1/00;B07B1/46;B28D5/00;C01B33/02;C01B33/037;H01L21/02;(IPC1-7):H01L21/30;H01L21/304 主分类号 F25C1/12
代理机构 代理人
主权项
地址