| 摘要 |
<p>This invention provides an article, compositions, methods of making and uses of vapor-deposited metal compounds immobilized on porous substrates. The substrate is a porous substrate having an average pore size of at least about 8 Å and a surface area of at least about 10 m2/g. The methods describe the vapor-deposition of an inorganic compound onto the substrate where the deposition is accomplished with a relatively small amount of ligand loss. The substrate can be pre-treated to achieve a uniformly dispersed metal compound deposited on the substrate. The inorganic compound can decompose into a metal compound. The article can also function as a catalyst for carbon-heteroatom coupling reactions such as carbon-carbon coupling reactions, most notably, the Heck reaction.</p> |
