发明名称 LIQUID PRECURSOR FOR FORMATION OF METAL OXIDES
摘要 A liquid precursor is provided for the formation of metal oxide films comprising a mixture of two or more types of beta-diketonate ligands bound to one or more metals. For example, a liquid mixture was formed of the mixed aluminum beta-diketonates derived from two or more of the ligands 2,6-dimethyl-3,5-heptanedione; 2,7-dimethyl-3,5-heptanedione; 2,6-dimethyl-3,5-octanedione; 2,2,6-trimethyl-3,5-heptanedione; 2,8-dimethyl-4,6-nonanedione; 2,7-dimethyl-4,6-nonanedione; 2,2,7-trimethyl-3,5-octanedione; and 2,2,6-trimethyl-3,5-octanedione. Films of metal oxides are deposited from vaporized precursor mixtures of metal beta-diketonates and, optionally, oxygen or other sources of oxygen. This process may be used to deposit high-purity, transparent metal oxide films on a substrate. The liquid mixtures may also be used for spray coating, spin coating and sol-gel deposition of materials.
申请公布号 WO9846617(A1) 申请公布日期 1998.10.22
申请号 WO1998US07829 申请日期 1998.04.17
申请人 THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE 发明人 GORDON, ROY, G.
分类号 C07F19/00;C23C16/00;C23C16/40;C23C18/12 主分类号 C07F19/00
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