发明名称 Photochemical cross-linding of polymers
摘要 Aryl and alkyl disulphonyl azides are prepared by reacting the disulphonyl chloride with sodium azide. Benzene, toluene, naphthalene, diphenyl, diphenyl, oxide, diphenyl methane, and butane are the specified aryl and alkyl radicals.ALSO:Polymers which contain groups which react with the decomposition products of sulphonylazide groups are cross-linked by exposing such polymers with a minor amount of a compound containing sulphonyl azide groups to light. Specified polymers are those containing hydroxyl groups e.g. an epichlorohydrin/2,2-bis (4-hydroxyphenyl)-propane condensation products or polyvinyl butyral, containing pyridine groups e.g. polyvinyl pyradine, containing phenyl groups e.g. styrene polymers and copolymers, or containing lactam groups e.g. poly N-vinylpyrrolidone. Specified azides are the disulphonyl azides of butane, benzene, toluene, diphenyl, diphenyl oxides or diphenyl methane and naphthalene. The polymeric layer may contain a photosensitizer such as Michler's ketone, a pyrazoline or a naphthothiazoline.
申请公布号 GB1062884(A) 申请公布日期 1967.03.22
申请号 GB19640024762 申请日期 1964.06.15
申请人 GEVAERT-AGFA N.V. 发明人 LARIDON URBAIN LEOPOLD;DELZENNE GERARD ALBERT;MADER HEIMUT;ULRICH HANS;HIMMELMANN WOLFGANG;SEIDEL BERNHARD
分类号 C08F2/46;C08F8/34;C08K5/43;G03F7/008 主分类号 C08F2/46
代理机构 代理人
主权项
地址