| 摘要 |
In the substrate processing method in which substrates are immersed in processing baths holding chemicals and pure water for processing, when a substrate carrier is moved from a first processing bath to a second processing bath, the substrate carrier is moved to a second processing bath with a chemical or pure water from the first processing bath held in the substrate carrier. In subjecting substrates to chemical processing and water rinse, the substrates in the substrate carrier are carried to a next processing bath with the chemical or pure water in the first processing bath held in the substrate carrier.
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