发明名称 Method for forming low contact resistance bonding pad
摘要 The present invention provides a method for forming a bonding pad having a low contact resistance. The method includes steps of: a) forming a bonding pad structure on a substrate having a metal layer by forming a passivation layer over said metal layer and etching the passivation layer with a fluorine-containing gas by which a fluorine-containing layer is formed on a surface of said bonding pad structure; and b) removing the fluorine-containing layer for reducing a contact resistance of said bonding pad structure.
申请公布号 US5824234(A) 申请公布日期 1998.10.20
申请号 US19960725122 申请日期 1996.10.02
申请人 MOSEL VITELIC, INC. 发明人 JOU, CHON-SHIN;WANG, TING-SING;CHEN, CHUN-LIN;TSAI, MING-HUAN;TSAI, MING-RU
分类号 H01L21/311;H01L21/60;(IPC1-7):H01L21/00 主分类号 H01L21/311
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