Method for the deposition of diamond film on an electroless-plated nickel layer

摘要

PCT No. PCT/KR94/00115 Sec. 371 Date Feb. 21, 1997 Sec. 102(e) Date Feb. 21, 1997 PCT Filed Aug. 24, 1994 PCT Pub. No. WO96/06206 PCT Pub. Date Feb. 29, 1996A method for the deposition of a diamond film, which includes the steps of immersing metallic or nonmetallic substrate in and electroless nickel plating bath containing a reducing agent to form a nickel layer; and depositing the diamond film on the electroless nickel plated substrate. As a result, employing electroless plating to form an inter layer is improved. In addition, the diamond film can be formed regardless of the type of materials used.