发明名称 FORMATION OF SIO2 CERAMIC FILM
摘要 PROBLEM TO BE SOLVED: To enhance the efficiency of formation of an SiO2 ceramic film by forming a coating film contg. polysilazane convertible into ceramics at a lowered temp. on the surface of a substrate and irradiating the film with UV. SOLUTION: A catalyst made of carboxylate of a metal such as Pd or Pt is added to polysilazane having a number average mol.wt. of 100-50,000 and a skeleton consisting of structural units represented by the formula (where each of R1 -R3 is H, phenyl, alkenyl, etc.), e.g. perhydropolysilazane so that the weight ratio between the carboxylate and polysilazane is regulated to (0.00001-2):1, especially 0.001:1 and they are brought into reaction to produce polysilazane convertible into ceramics at a lowered temp. Additive including a UV absorber are added by 0.05-10 pts.wt. 1 pt.wt. of the polysilazane and they are applied on a substrate such as a polyester film in 50 Å to 5 μm thickness. The resultant coating film is irradiated with UV of 200-350 nm wavelength for 0.05-3 min to form the objective SiO2 ceramic film. This film is made dense if necessary by heat treatment at room temp. to 150 deg.C in an atmosphere of steam.
申请公布号 JPH10279362(A) 申请公布日期 1998.10.20
申请号 JP19970080587 申请日期 1997.03.31
申请人 TONEN CORP 发明人 YAMADA KAZUHIRO;FUNAYAMA TORU
分类号 B05D7/24;C04B35/589;C04B41/50;C08J7/04;C09D183/16 主分类号 B05D7/24
代理机构 代理人
主权项
地址
您可能感兴趣的专利