发明名称 Electron beam tester
摘要 An Electron Beam Tester which corrects deformation of a secondary electron image produced from scanning a sample with an electron beam. The secondary electron image is stored in a storage unit. Luminance data of the stored image is accumulated to obtain a projected luminance distribution. The projected luminance distribution data is then analyzed by a parallelism evaluation unit to obtain a rotation angle. Then the rotation angle is used to determine maximum parallelism and correct deformation of the secondary electron image by providing deflection control which transforms the deflectors .
申请公布号 US5825912(A) 申请公布日期 1998.10.20
申请号 US19970783304 申请日期 1997.01.10
申请人 FUJITSU LIMITED 发明人 OKUBO, KAZUO;TEGURI, HIRONORI;ITO, AKIO
分类号 G01R31/307;G06K9/46;G06T7/00;(IPC1-7):G21K1/00 主分类号 G01R31/307
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