发明名称 |
Electron beam tester |
摘要 |
An Electron Beam Tester which corrects deformation of a secondary electron image produced from scanning a sample with an electron beam. The secondary electron image is stored in a storage unit. Luminance data of the stored image is accumulated to obtain a projected luminance distribution. The projected luminance distribution data is then analyzed by a parallelism evaluation unit to obtain a rotation angle. Then the rotation angle is used to determine maximum parallelism and correct deformation of the secondary electron image by providing deflection control which transforms the deflectors .
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申请公布号 |
US5825912(A) |
申请公布日期 |
1998.10.20 |
申请号 |
US19970783304 |
申请日期 |
1997.01.10 |
申请人 |
FUJITSU LIMITED |
发明人 |
OKUBO, KAZUO;TEGURI, HIRONORI;ITO, AKIO |
分类号 |
G01R31/307;G06K9/46;G06T7/00;(IPC1-7):G21K1/00 |
主分类号 |
G01R31/307 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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