| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymerizable composition excellent in sensitivity upon exposure to light in the visible region by mixing an ethylenically unsaturated addition-polymerizable compound with a photopolymerization system comprising dipyrromethene difluoroborate sensitizer and a radical generator which generates active radicals upon irradiation with light in the presence of the sensitizer. SOLUTION: The ethylenically unsaturated addition-polymerizable compound is exemplified by an unsaturated carboxylic acid, an alkyl ester thereof or an ester of an aliphatic or aromatic polyhydroxy compound, more particularly methyl (meth)acrylate or maleate. The photopolymerization initiation system comprises a sensitizer of formula I[wherein at least one of R<1> to R<7> is an alkyl branched in positionαorβ, and the rest are each hydrogen, cyano, chloro, a 1-10 C alkyl or the like; a substituted vinyl group of the formula II (wherein n is 0-4; R<8> is hydrogen or a 1-10 C alkyl: and R<9> is a 4-20 C heterocyclic group or the like) or the like] and a radical generator such as a titanocene compound. |
