发明名称 X-RAY EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To enhance throughput by forming a structure protruding from a reference surface of an X-ray mask stage, so that an X-ray outputting window is intruded into a recess of a rear surface of an X-ray mask, thereby efficiently irradiating a radioactive ray on a wafer. SOLUTION: An X-ray outputting window 3 for outputting a radiant ray 13 exists at a center of an X-ray mask stage for mounting an X-ray mask 5. The window 3 has a structure in which the window 3 protrudes from an X-ray mask stage reference surface 2 to intrude into a recess of a rear surface of the mask 5. A distance from the rear surface of the mask 5 to a mask frame 6 is accurately set. Since thicknesses of the frame 6 and an iron piece 9 are accurately decided, a position of a magnet 7 mounting surface from the surface of an X-ray mask stage 1 is accurately decided. The position of the mask 5 is accurately decided by thus positioning. Accordingly, a gap between the mask 5 and the window 3 can be reduced to 1/10 or less of that of prior art, and hence a reduction can be suppressed to 3% or less.
申请公布号 JPH10275754(A) 申请公布日期 1998.10.13
申请号 JP19970094984 申请日期 1997.03.28
申请人 N T T ADVANCE TECHNOL KK 发明人 OKI SHIGEHISA;OZAWA AKIRA
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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