Three dimensional imaging system

摘要

The photolithography tool of the present invention in its simplest embodiment includes an afocal lens system and a three-dimensional master or mask. The three-dimensional mask is located within the object space of the afocal lens system and is imaged onto a three-dimensional circuit carrier or substrate located within the imaging space of the afocal lens system. By using an afocal lens, with which persons skilled in instrumental optics are familiar, a system can be designed for which the object space is identical to the imaging space for unity magnification. As a result, a mask can be used in which the surface contour and pattern to be imaged is identical to the desired substrate surface and pattern, thereby simplifying mask design.