发明名称 Thin film deposition method and gas sensor made by the method
摘要 A gas sensor including a substrate, a heater formed on said substrate, and a gas sensing material to be heated by said heater, wherein the area of the substrate under the heater is removed or reduced in its thickness to form a cavity. The thickness of the layer of the gas sensing material is reduced gradually toward the peripheral of the gas sensing material.
申请公布号 US5821402(A) 申请公布日期 1998.10.13
申请号 US19970812557 申请日期 1997.03.07
申请人 TOKYO GAS CO., LTD. 发明人 OKAJIMA, YUICHIRO;KIKUCHI, KEI;IDE, TAKAHIRO;NAKAMURA, KENICHI
分类号 C23C16/04;C23C16/46;C23C18/06;G01N27/12;(IPC1-7):H01L23/58 主分类号 C23C16/04
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