发明名称 |
Thin film deposition method and gas sensor made by the method |
摘要 |
A gas sensor including a substrate, a heater formed on said substrate, and a gas sensing material to be heated by said heater, wherein the area of the substrate under the heater is removed or reduced in its thickness to form a cavity. The thickness of the layer of the gas sensing material is reduced gradually toward the peripheral of the gas sensing material.
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申请公布号 |
US5821402(A) |
申请公布日期 |
1998.10.13 |
申请号 |
US19970812557 |
申请日期 |
1997.03.07 |
申请人 |
TOKYO GAS CO., LTD. |
发明人 |
OKAJIMA, YUICHIRO;KIKUCHI, KEI;IDE, TAKAHIRO;NAKAMURA, KENICHI |
分类号 |
C23C16/04;C23C16/46;C23C18/06;G01N27/12;(IPC1-7):H01L23/58 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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