发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, AND PRODUCTION OF PHOSPHOR PATTERN BY USING THEM
摘要 PROBLEM TO BE SOLVED: To form a high precision phosphor pattern of a uniform shape with high work efficiency and to prevent the deterioration of the surface of a substrate for a plasma display panel by incorporating a polymer binder, a photopolymerizable unsatd. compd., a photo-initiator and a phosphor and specifying the content of a sulfonic acid deriv. SOLUTION: This photosensitive resin compsn. contains a polymer binder, a photopolymerizable unsatd. compd. having an ethylenic unsatd. group, a photo- initiator forming free radicals when irradiated with active light and a phosphor and contains <500 ppm by weight (expressed in terms of elemental sulfur) of a sulfonic acid deriv. The polymer binder is preferably a vinyl copolymer and the photopolymerizable unsatd. compd. may be any of compds. known as photopolymerizable multifunctional monomers. The photo-initiator is, e.g. arom. ketone or N,N'-tetramethyl-4,4'-diaminobenzophenone. The phosphor is not especially limited and an ordinary metal oxide-base phosphor may be used.
申请公布号 JPH10274846(A) 申请公布日期 1998.10.13
申请号 JP19970079418 申请日期 1997.03.31
申请人 HITACHI CHEM CO LTD 发明人 NOJIRI TAKESHI;TANAKA HIROYUKI;SATO KAZUYA;KIMURA NAOKI;ASHIZAWA TORANOSUKE;TAI SEIJI;MUKAI IKUO;OTOMO SATOSHI
分类号 G03F7/004;B32B7/02;G03F7/027;G03F7/40;H01J9/227;H01J17/49 主分类号 G03F7/004
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