发明名称 Process for forming and using a non-reactive anti-reflection coating
摘要 An anti-reflection coating is provided that has a barrier layer and an anti-reflective layer. The barrier layer stops reactions between the anti-reflective layer and underlying layers or substrates, does not make the anti-reflective layer reflective, and preferably does not react with either the reflective layer or the anti-reflective layer. In particular embodiments, the barrier layer is a thin layer of silicon dioxide SiO2 or silicon nitride Si3N4, and the anti-reflective layer is titanium-tungsten TiW, titanium nitride TiN, or amorphous silicon.
申请公布号 US5820926(A) 申请公布日期 1998.10.13
申请号 US19950479881 申请日期 1995.06.07
申请人 INTEGRATED DEVICE TECHNOLOGY, INC. 发明人 LIEN, CHUEN-DER
分类号 G03F7/09;H01L21/027;H01L21/3213;(IPC1-7):G03C1/00 主分类号 G03F7/09
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