| 摘要 |
A method for the manufacturing of an array of MxN thin film actuated mirrors for use in an optical projection system, the inventive method includes the steps of: preparing an active matrix; depositing a passivation layer and an etchant stopping layer; depositing a thin film sacrificial layer; creating an array of MxN pairs of empty cavities and a continuous sacrificial area to thereby form a combination layer; forming an array of MxN actuated mirror structures, each of the actuated mirror structures including a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode, an elastic member; and removing the thin film sacrificial layer, thereby forming the array of MxN thin film actuated mirrors. During the forming of the actuated mirror structures, since the iso-cut are placed above the continuous sacrificial area, even if the patterns and the iso-cuts coinside, the etchant stopping layer will not be damaged and hence during the removal of the continuous sacrificial area, the etchant will only attack the continuous sacrificial area, and the passivation layer and the active matrix located therebelow will not be affected.
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