发明名称 COMPOSITION FOR MANUFACTURING LIGHT-SENSITIVE LAYER OF VESICULAR MATERIAL
摘要 FIELD: light-sensitive materials. SUBSTANCE: composition contains, wt. -%: vinylidene chloride/acrylonitrile/methyl methacrylate copolymer or mixture of vinylidene chloride/acrylonitrile copolymer with poly(methyl methacrylate) (weight ratio 4:1), 15.94-16.55; 4- diazo-N,N-diethylaniline borofluoride or 4-diazo-2,5- diethoxyphenylmorpholine borofluoride, 1.53-1.67; acetone, 66.7-73.2; and ethyl Cellosolve or methyl Cellosolve, the balance. Composition allows its preparation time to be reduced by 168 h and toxic solvent to be avoided. Composition can be used to prepare vesicular materials applicable for copying microfilms. EFFECT: speeded up preparation and improved environmental condition. 1 tbl
申请公布号 RU1514138(C) 申请公布日期 1998.10.10
申请号 SU19884382645 申请日期 1988.02.19
申请人 PERESLAVSKIJ FILIAL VSESOJUZNOGO GOSUDARSTVENNOGONAUCHNO-ISSLEDOVATEL'SKOGO I PROEKTNOGO INSTITUTAKHIMIKO-FOTOGRAFICHESKOJ PROMYSHLENNOSTI 发明人 JAKOVLEV V.B.;DJUDINA N.A.;ORLOV I.G.
分类号 G03C1/52 主分类号 G03C1/52
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