| 摘要 |
PROBLEM TO BE SOLVED: To eliminate a trouble resulting from the deterioration of global alignment accuracy caused by an expansion/contraction and an alignment offset of a substrate which occur during exposure by measuring the alignment offset of a measured shot position again and correcting conversion parameters, based on the measured results. SOLUTION: The route of stepping movement is formed in a spiral state which is spread outward from a shot position at the center of a substrate and each outside shot is exposed after outside measured shot positions are again measured and conversion parameters are corrected when the exposure at a prescribed inside shot position is terminated. In this case, the number of shot positions to be measured again is set at four and the correction of the conversion parameters can be performed on those related to the expansion and contraction of the substrate. Specifically, all sample shots S1-S4 are realigned during exposure. When this method is used, not only the alignment offset of a substrate in X- and Y-directions and magnification variation which are caused by a temperature change, but the offset in theθ-direction can also be coped with. |
