| 摘要 |
<p>PROBLEM TO BE SOLVED: To prevent a spot defect, etc., due to a contact defect between a TFT and a pixel electrode and to improve the reliability of display quality by forming a substrate film for making an inter-layer insulating film position high below a through hole formation area of the inter-layer insulating film. SOLUTION: Below the formation area of a through hole 43 on a transparent insulating substrate, the substrate film is formed in the same layer with the formation layer of the TFT 18. The coated surface of spin coated the photoresist so as to form the through hole 43 has almost same height with the height of the top surface of the TFT 18, so the film thickness of the photoresist in the through hole formation area can be made thin. Even when the aperture pattern of the photoresist is fine, the photoresist can securely be patterned and then the through hole 43 can securely be formed in the inter- layer insulating film by using the photoresist as a mask. Therefore, a connection defect between the TFT 18 and pixel electrode 47 can be eliminated without causing the aperture rate of the liquid crystal display device from decreasing and a liquid crystal display element of high display quality is obtained.</p> |
