| 摘要 |
PROBLEM TO BE SOLVED: To accurately perform overlay exposure by exposing an alignment mark at a prescribed position designed for an actual exposed pattern on a photosensitive substrate by projection exposing an alignment mark formed on a member upon the substrate through an projection optical system. SOLUTION: When the patterns on reticles 121-124 are projection exposed on a plate 202 placed on a plate stage 201, light having wavelength for exposure is selected out of the light emitted from a light source 101 by means of an interference filter, etc., and projected upon the reticles 121, etc., through a lighting optical system 100. As a result, the patterns on the reticles are transferred to the plate 202 through a projection optical system 112. When these exposing operations are continuously performed by using a plurality of reticles, for example, the four reticles 121-124, a large liquid crystal panel is formed. The image of an irradiated reference mark 141 is formed on a fixed mark arranged on the image forming surface of the projection optical system 112 through the optical system 112. |
