发明名称 OPTICAL SYSTEM FOR EXPOSING CIRCUIT PATTERN
摘要 PROBLEM TO BE SOLVED: To manufacture an optical system at a low cost as a whole without deteriorating the characteristics of the system, such as the durability, light transmittance, etc., even when the system emits ArF excimer laser by constituting the optical system by combining synthetic quarts glass with fluorite. SOLUTION: An optical system for exposing circuit pattern having means transmissivity of >=98.0%/cm as a whole is constituted by using a single-crystal fluorite optical body which has a hydrogen molecule concentration CH2 of 5×10<17> to 5×10<18> molecules/cm<3> , a refractive index distributionΔn of <=2×10<-6> /cm, and an amount of double refraction of <=1 nm/cm in a first synthetic glass optical body having transmissivity of >=99.5% at the wavelength 193 nm of ArF laser light and a light energy densityεof 0.1-0.4 mJ/cm<2> and a refractive index distributionΔn of <=3×10<-6> and an amount of double refraction of >=h2.0 nm/cm in a second synthetic quartz glass optical body having a light energy densityεof >=0.4 mJ/cm<2> and transmissivity of >=99.8% at the wavelength 193 nm of ArF laser light.
申请公布号 JPH10270351(A) 申请公布日期 1998.10.09
申请号 JP19970090232 申请日期 1997.03.25
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 FUJINOKI AKIRA;NISHIMURA HIROYUKI
分类号 G02B13/24;G02B1/02;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B13/24
代理机构 代理人
主权项
地址