| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device for micro processing by which desired micro fabrication can be performed on a substrate by utilizing etching, etc. SOLUTION: Firstly, an organic silane-based material 3 adsorbed to the surface of a substrate 1 is decomposed from the part to be subjected to first process of the substrate 1 by irradiating the part of the substrate with light. Then a very small conductive probe 22 is moved and positioned to the part to be subjected to second process of the substrate 1 while a transferred pattern is confirmed and the organic silane film 3 on the substrate is decomposed by relatively moving the probe 22 to the substrate 1 while a desired voltage is applied across the substrate 1 and probe 22. Finally, the substrate 1 is etched after the substrate 1 is processed through a probe lithography process. |
