| 摘要 |
The invention relates to a plasma torch system comprising a high-frequency plasma torch with a plasma torch device, wherein a plasma flame can be produced by supplying high-frequency energy, in addition to comprising a processing chamber, wherein workpieces can be positioned in order to enable processing by said plasma flame. In order to create a universally applicable system, the plasma torch system is provided with a height adjustment device enabling regulation of a vertical distance between the plasma torch device pertaining to the high-frequency torch and the workpiece which is to be processed.
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