| 摘要 |
<p>A method of forming an A-site deficient thin-film manganate material on a substrate from corresponding precursor(s), comprising liquid delivery and flash vaporization thereof to yield a precursor vapor, and transporting the precursor vapor to a chemical vapor deposition reactor for formation of an A-site deficient manganate thin-film on a substrate. The invention also contemplates a device comprising an A-site deficient manganate thin-film, wherein the manganate layer is formed on the substrate by such a process and is of the formula: LaxMyMnO3, where M = Mg, Ca, Sr, or Ba, and (x + y) < 1.0, and preferably from about 0.5 to about 0.99.</p> |
