| 摘要 |
<p>A method for forming a conductively coated matrix structure for separating rows and columns of sub-pixels (106) on the faceplate (104) of a flat panel display device. One embodiment deposits a photoresistive material (108) over the interior surface (102) of a faceplate having a non-conductive opaque matrix structure (100) formed thereon, and into sub-pixel regions separated by the matrix structure. The photoresistive material is dried and exposed to light (112) in the sub-pixel regions. After unexposed photoresistive material (110) is removed, a layer of aluminum is evaporated onto the interior surface of the faceplate such that the matrix structure and the exposed layer of photoresistive material in the sub-pixel regions is coated with conductive aluminum. Next, an etchant is applied to the exposed photoresistive material disposed in the sub-pixel regions, removing the exposed photoresistive material and the overlying Al layer from the sub-pixel regions, such that the conductive Al layer remains only on the matrix structure, and does not cover the sub-pixel regions.</p> |
