发明名称 Composition and process for forming electrically insulating thin films
摘要 <p>Herein we provide a composition for the formation of insulating films that have a low dielectric constant. The composition comprises (A) an electrically insulating curable resin selected from the group consisting of electrically insulating curable organic resins and electrically insulating curable inorganic resins; and (B) at least two solvents: (B)(i) a solvent capable of dissolving resin (A) and (B)(ii) a solvent whose boiling point or vapor pressure curve differs from that of solvent (B)(i) or whose affinity for resin (A) differs from that of solvent (B)(i). Also claimed is a method for forming a insulating films that have a dielectric constant of less than 2.7.</p>
申请公布号 EP0869515(A1) 申请公布日期 1998.10.07
申请号 EP19980105809 申请日期 1998.03.30
申请人 DOW CORNING TORAY SILICONE COMPANY, LIMITED 发明人 KOBAYASHI, AKIHIKO;MINE, KATSUTOSHI;NAKAMURA, TAKASHI;SASAKI, MOTOSHI;SAWA, KIYOTAKA
分类号 C08L83/06;C08G77/12;C04B41/49;C04B41/84;C08L83/05;C09D183/04;C09D183/05;C09D183/06;H01B3/46;H01L21/312;H01L21/314;H01L21/316;H01L21/768;H01L23/522;(IPC1-7):H01B3/46;C04B41/50 主分类号 C08L83/06
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