发明名称 HIGH MOLECULAR COMPOUND AND CHEMICALLY AMPLIFYING POSITIVE TYPE RESIST MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain the subject new compound useful as a more sensitive and high resolution resist material. SOLUTION: This high molecular compound having 1,000-500,000 weight average molecular weight has a repeating unit of the formula [R<1> is H or methyl; R<2> is a 1-8C alkyl; R<3> is H; R<4> is COOR<5> (R<5> is H, etc.); (x) is 0 or a positive integer; (y) is a positive integer; (p) and (q) are each a positive number; etc.], in which a part of hydrogen atoms of a phenolic hydroxyl group and/or a carboxyl group is partially substituted with one or more kinds of an acid unstable group, and a part of the remaining phenolic hydroxyl group and/or carboxyl group reacts with an alkenyl compound or a halogenated alkyl ether compound to form intramolecular and/or intermolecular C-O-C group and to crosslink the compounds with the formed intramolecular and/or intermolecular C-O-C group, and includes average 0-80 mol.% total amount of the acid unstable group and crosslinking group based on the total of the phenolic hydroxyl group of the formula and carboxyl group.
申请公布号 JPH10265524(A) 申请公布日期 1998.10.06
申请号 JP19980017972 申请日期 1998.01.14
申请人 SHIN ETSU CHEM CO LTD 发明人 MOTOUMI KIYOSHI;WATANABE OSAMU;WATANABE SATOSHI;NAGURA SHIGEHIRO;ISHIHARA TOSHINOBU
分类号 G03F7/039;C08F8/00;C08F12/24;C08F20/06;C08F20/12;H01L21/027;(IPC1-7):C08F12/24 主分类号 G03F7/039
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