| 摘要 |
PROBLEM TO BE SOLVED: To obtain an Ni-Ti alloy bar workable into a prescribed dimension and shape with a high accuracy and industrially excellent in etching characteristic by specifying both the draft at cold rolling and the thickness of an oxide film, respectively. SOLUTION: This bar is an Ni-Ti alloy bar for etching, prepared by cold rolling at >=5% draft and having an oxide film of 0.01 to 5μthickness. It is desirable to regulate the thickness of the oxide film to 0.05 to 1μ. Because the ratio between the width (a) of the part, from the application of a photoresist 2, of the above Ni-Ti shape memory alloy bar 1 and the maximum etched width (b) in the cross sectional part 3 after etching, a/b, becomes a measure of etching characteristic and its value becomes close to 1 that is a value in the case of ideal etching, working can be performed with high accuracy into the prescribed dimensions and shape. When the thickness of the oxide film is bellow 0.01μor exceeds 5μ, etching characteristic is deteriorated. Further, etching characteristic is also deteriorated when draft is less than 5%.
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