发明名称 PROCESSING OF GAS CONTAINING SILANES
摘要 <p>PROBLEM TO BE SOLVED: To inexpensively treat a gas containing silanes to remove or decrease specific silanes in the gas by carrying out a contact of the gas containing the silanes with silanes or disilanes having higher boiling points than the silanes in the gas. SOLUTION: This treatment of the gas containing the silanes expressed by formula (R is an 1-12C monovalent hydrocarbon group; X is a halogen; a and b are each an integer of 0-4 and satisfies a+b=0-4) is made to contact with the silanes having higher boiling point than these silanes or trimethylchlorodisilane, dimethyltetrachlorodisilane, etc., allowing to remove or decrease the silanes in the prescribed gas containing the silanes.</p>
申请公布号 JPH10265480(A) 申请公布日期 1998.10.06
申请号 JP19970091666 申请日期 1997.03.26
申请人 SHIN ETSU CHEM CO LTD 发明人 HASEGAWA MASAYUKI;OGIWARA KAZUO;KOBAYASHI HIROYUKI;SATO YUKINORI;SHIROTA YOSHIHIRO;FURUYA KATSUAKI
分类号 C07F7/12;B01D53/70;B01D53/72;B01D53/77;C07C7/12;C07F7/20;(IPC1-7):C07F7/12 主分类号 C07F7/12
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