发明名称 Method of fabricating a field emission device
摘要 The invention generally relates to the technical field of devices using the effect to emit electrons out of a solid into vacuum due to high electric field strength. Such devices are usually called field emission devices. The invention relates more specifically to the structure of a field emission device, to the method of fabricating a field emission device, and to the use of a multitude of field emission devices in the technical field of flat panel displays. The inventive structure of a field emission device (15) comprises an individual series resistor for each electron emitting tip (1), wherein the series resistor is formed by the tip (1) itself. The tip (1) comprises a body (9) of a first material with high resistivity and an at least partial coating (7) of a second material with low work function, wherein the body (9) of the first material forms the series resistor and the coating (7) of the second material provides for electron emission. The method for fabricating a field emission device (15) uses depositing and sacrificial layer etch back techniques to provide easy and precise control of tip height and shape and also easy and precise control of the tip-to-gate distance and geometry.
申请公布号 US5817201(A) 申请公布日期 1998.10.06
申请号 US19970876583 申请日期 1997.06.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GRESCHNER, JOHANN;PLESHKO, PETER;SCHMID, GERHARD
分类号 H01J1/304;H01J9/02;(IPC1-7):H01J9/12 主分类号 H01J1/304
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