发明名称 Instrument and method for 3-dimensional atomic arrangement observation
摘要 <p>3-dimensional observation is carried out on the atomic arrangement and atomic species in a thin-film specimen at an atomic level in order to clarify the existence states of defects and impure atoms in the crystals. For that purposes, an instrument and a method for 3-dimensional observation of an atomic arrangement are implemented by a system comprising a scanning transmission electron microscope equipped with a field emission electron gun (8) operated at an acceleration voltage of greater than 200 kV, a specimen goniometer/tilting system (12) having a control capability of the nanometer order, a multi-channel electron detector (13) and a computer (14) for executing software for controlling these components and 3-dimensional image-processing software. Point defects and impure atoms, which exist in joint interfaces and contacts in a ULSI device, can thereby be observed. As a result, the causes of bad devices such as current leak and poor voltage resistance can be analyzed at high accuracy. <IMAGE></p>
申请公布号 EP0513776(B1) 申请公布日期 1998.09.30
申请号 EP19920108109 申请日期 1992.05.13
申请人 HITACHI, LTD. 发明人 KAKIBAYASHI, HIROSHI;MITSUI, YASUHIRO;TODOKORO, HIDEO;KURODA, KATSUHIRO
分类号 H01J37/20;G01N23/04;G01Q30/02;G01Q60/10;G01Q80/00;G01R31/305;H01J37/22;H01J37/244;H01J37/28;(IPC1-7):G01N23/04 主分类号 H01J37/20
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