| 摘要 |
1499549 Depositing ruthenium INCO EUROPE Ltd 14 May 1976 [20 May 1975] 21497/75 Heading C7F Ru is deposited on a hot substrate e.g. sintered carbides, high speed steel, Ti, glass, diamond, by decomposing in a substantially static partial vacuum, the vapour of a complex of Ru with a # dicarbonyl R 1 -CO-CHR 2 -CO-R 3 where R 1 and R3 are alkyl, haloalkyl, alkoxy, aryl or alkyl, nitro or halo substituted aryl groups and R 2 is hydrogen or an alkyl or haloalkyl group. The preferred Ru complexes are those with acetylacetone CH 3 -CO-CH 2 -CO-CH 3 , trifluoro (acetylacetone) CF 3 -CO-CH 2 -CO-CH 3 , and hexafluoro (acetylacetone) CF 3 -CO-CH 2 -CO-CF 3 . The substrate is heated to 550-650‹C or 700- 750‹C and the Ru complex to 200-210‹C or 130-150‹C according to the complex used to vaporize the complex which is then decomposed on the heated substrate. A static vacuum i.e. where pumping has ceased, of 10<SP>-1</SP> - 10<SP>-3</SP> torr is preferred during deposition. The coated substrate may be heated to 1250-1400‹C to effect diffusion or the substrate may be removed by chemical dissolution e.g. to form Ru enucilites. The process may be used for coating the faces and cutting edge of cemented carbide or H.S.S. cutting tools, coated soldering irons or coated electrical contacts. |
