发明名称 GAS SCRUBBER AND GAS TREATMENT BY UTILIZING THE SAME
摘要 PROBLEM TO BE SOLVED: To make it possible to effectively remove the gases into which the harmful components generated during the production process of semiconductor devices are included by utilizing a burning device and an adsorption device and subjecting the inflammable harmful components to a primary treatment with the burning device, then subjecting these components to the adsorption treatment of the residual harmful components. SOLUTION: This gas scrubber has the burning device 1 which is supplied with the gases generated in the production process for the semiconductor devices through on induction pipe 13 into a box-shaped cabinet 3 having a door on its one lateral side and which functions to burn these gases and the adsorption device 2 which adsorbs the compsn. of the gases unburned by the burning device 1 and physically and chemically treats the adsorption components. The burning device 1 is constituted to burn the gases by the ceramic heaters built therein and to recover the sludge generated at this time into a storage vessel 7. The combustion gases are cooled by a cooler 44 which is disposed around the burning device 1 and uses cooling water during the time the gases are supplied from the burning device 1 to the adsorption device 2.
申请公布号 JPH10263357(A) 申请公布日期 1998.10.06
申请号 JP19970339821 申请日期 1997.12.10
申请人 KOREA MAT CO LTD 发明人 KIM DONG SOO
分类号 B01D53/34;B01D53/04;B01D53/46;B01D53/81;B01D53/82;B01D53/86;B01D53/88;F23G7/06;F23J3/02;F23J15/02;F23J15/06;H01L21/205;H01L21/31 主分类号 B01D53/34
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