| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode plate for plasma etching which is less consumed by etching and is suppressed in the generation of particles. SOLUTION: This electrode plate consists of the following planar glassy carbon material: The relative intensity ratio R thereof is defined by the equation: R=IA/IB in the Raman spectral analysis using an argon ion laser beam of a wavelength 5145 angstrom. The material has such structure characteristic that the difference in the R value between the surface layer part and the central part at the section is <=0.1 and the R value in the central part at the section is in a range of 1.2 to 1.7. In the equation, IA denotes the spectral intensity in a band region of 1260±100cm<-1> and IB spectral intensity in a band region of 1580±100cm<-1> . |
