| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel positive photosensitive composition suitable for a lithographic printing plate and high in printing resistance by incorporating a specified fluoropolymer in this composition. SOLUTION: This positive photosensitive composition comprises a polyurethane resin comprising (1) a diol or diisocyanate substituted by F atoms for the H atoms of the C atoms, (2) a diol or a diisocyanate having a -X- organic group (X is a divalent organic group having a hydrocarbon component selected only from the one composed of cycloalkyl, cycloalkylene, and the like, and (3) a diol or diisocyanate having an acidic group obtained by combining an acidic H atom with an N atom, in the total amount of (1), (2), and (3) of >=90weight%; a polymer compound soluble in water, and soluble or swellable in an alkali solution; and a positively functioning photosensitive compound. |
