RESIST PEELING LIQUID

摘要

PROBLEM TO BE SOLVED: To integrally peel and completely remove not only resists sticking onto substrates but side wall protective films consisting of resists changed in properties by dry etching as well by using a glycol ether-based solvent as an essential component and incorporating an org. amine compd. therein. SOLUTION: This resist peeling liquid dissolves and peels the resists sticking to the substrates and the side wall protective films and is removed by washing using supercritical fluid. This liquid consists essentially of the glycol ether-based solvent and contains the org. amine compd. The content of the org. amine compd. is within a range from 1 to 20 wt.% and the glycol ether-based solvent is diethylene glycol monomethyl ether. The org. amine compd. is alkylamines or alkylpropyldiames. The alkylamines are any of monopropylamine, etc., and the alkylpropyldiames are 3(methylamino)propylamine.