PURIFICATION OF HYDROGEN PEROXIDE SOLUTION

摘要

PROBLEM TO BE SOLVED: To provide a method for purifying a hydrogen peroxide solution extremely low in concentration of anion contents and metal components as impurities, therefore capable of providing a high purity hydrogen peroxide solution suitably usable for a semiconductor producing process. SOLUTION: This method for purifying a hydrogen peroxide solution comprises removing anion components and metal components as impurities from a crude hydrogen peroxide solution containing anion components and metal components as impurities and includes the following first and second processes. A solution passing space velocity of the hydrogen peroxide solution to a resin column in the second process is higher than that of the hydrogen peroxide solution to the resin column in the first process. The first process: passing the hydrogen peroxide solution through an anion exchange resin column and a cation exchange resin column or the anion exchange resin column and a chelate resin column. The second process: passing the hydrogen peroxide solution obtained in the first process through the anion exchange resin column and the cation exchange resin column.