| 摘要 |
PROBLEM TO BE SOLVED: To accurately perform a pattern exposure without reducing a throughput even if the temperature of a material changes. SOLUTION: Based on the temperature of a sample 3 that is measured by a temperature-measuring instrument 6 and the stage position coordinates of the sample 3 that are measured by a coordinate counter 9, the stage position coordinates when the sample 3 is exposed are converted into stage position coordinates at normal temperatures. Then, a charged particle beam optical system is controlled by a drawing control device 11 so that a pattern to be exposed to the stage position coordinates at normal temperatures being obtained by the coordinate conversion device 8 can be exposed to the stage position coordinates on exposure. As a result, the exposed pattern becomes stage position coordinates at normal temperatures when the sample 3 returns to normal temperatures. |
